WebMar 21, 2024 · High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, … WebMar 24, 2024 · A timely replacement of the rather expensive indium-doped tin oxide with aluminum-doped zinc oxide is hindered by the poor uniformity of electronic properties when deposited by magnetron sputtering. Recent results demonstrated the ability to improve the uniformity and to decrease the resistivity of aluminum-doped zinc oxide thin films by …
US Patent Application for MOVABLE MAGNET ARRAY FOR MAGNETRON …
WebRotary Magnetron Magnet Bar and Apparatus Containing the Same for High Target Utilization: An apparatus for coating a substrate is provided that i ... An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight ... WebC-band SW accelerating structure of a 12 MeV race-track microtron, which is under construction at the Technical University of Catalonia, and its RF system with a 5712 MHz magnetron as a source. Results of cold tests of the accelerating structure, before and after the brazing, and of high-power tests of the RF system at a special stand are reported. meridian waste holiday schedule 2022
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WebJun 17, 2015 · Thin Films Current source supplies are ideal for pulsed dual magnetron sputtering (DMS). They have the advantage of little to no current rise when an arc occurs, and they enable arc detection by voltage fall due to high incremental impedance. Process stability is another advantage. WebA new magnet bar magnetic design provides a solution to both keeping the magnetic field constant around the racetrack and improving target utilization. The patent pending … WebRotary magnetron sputtering is well known in the art following McKelvey, AS EVIDENCED BY U.S. Pat. No. 4,446,877. FIGS. 1A, 1B, 2A, and 2B show a conventional, prior art rotary magnetron with a sputter racetrack 2proximal to the outer surface of the target tube cylinder 1. the target cylinder 1is supported on a backing tube 14. meridian watches uk